美国赛伦科技为AST在中国地区的授权总销售服务商,赛伦科技在上海,北京分别设有办事处。
美国AST(AngstromSunTechnologiesInc)是世界主要针对科研单位提供:spectroscopicellipsometer(SE),spectroscopicreflectometer(SR)andMicrospectrophotometer(MSP)的知名供应商。客户遍布全球主要科研大学及主要半导体厂商:
NIST
ISMI
NASA
JPL
MarshallSpaceCenter
AirForce
MIT
ColumbiaUniversity
UCBerkeley
GeorgiaTech
UniversityofVirginia
USTC,China
...
BellLaboratories
HP
GE
LockheedMartin
Corning
AppliedMaterials
FirstSolar
DowChemical
Samsung
TexasInstruments
NationalSemiconductor
...
美国赛伦科技上海办事处
吴惟雨/CavenWu Cell:
QQ:
上海市黄浦区陆家浜路1378号万事利大厦
Reflectometer(SR)
Ellipsometer(SE)
Spectroscopicellipsometry(SE)isapowerfultechniquetopreciselymeasurethinfilmthickness,determineopticalconstants,investigatesurfaceandinterfacephenomenonandmanyotherphysical,chemicalandopticalpropertiesofmaterials.AngstromSunTechnologiesIncdesignsandmanufactureshighqualityspectroscopicellipsometersystemswithvariousoptionsfordifferentapplications.Besidesellipsometersystemitself,theadvancedanalysissoftwareisessentialtoextractthedesiredinformationasabove-mentioned,suchasthickness,roughness,alloyconcentrationanddielectricconstants.TFProbe™3.0fromusofferspowerfulanalysisfunctionsforellipsometrysensitivitystudy,photometry/ellipsometrysimulationanddataregression.UniquebutconfigurablemodeallowsdifferentuserstoaccessdifferentlevelandsuitableforbothR&Dandproductionqualitycontrolpurpose.
Modelsarespecifiedbasedonwavelengthrangesfordifferentapplications.Thefollowinggraphshowsavailablemodelsfor standardconfigurations.Inaddition,Model500 simplycoversarangeofbothModel100and400.Customizedproducts areavailablewithwavelengthrangeextensionfurtherdowntoDUVorInfrared(IR)ranges.Normally:
Model100coversawavelengthrangefromDUVtoNIRrangeupto1100nm.
Model200coversDUVandVisiblerange.
Model300coversVisiblerange,startingfrom370nmto850nm
Model400coversNIRrangestartingfrom900nmtypically
Model450coversVistoNIRrange,startingfrom370nmupto1700nmtypically
Model500coversDUVtoNIRrange,upto2500nm
Model600coversNIRtoIRrange(1.7umto17umor1.7umto30um)
Wavelengthrangecoveragedependsonseveralfactorssuchaslightsource,detectors,opticsusedinsystem,lightdeliverymethod(usingfibersornot).Becauseofthesefactors,alltoolscanbecustomizedbasedonspecificapplication.Forexample,NIRrangecanbecoveredupto1700nmor2200nmor2500nmetc.DUVrangecanbedownto190nm.
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设备型号说明:
ExampleModel:SE200BA-M300
SE:SpectroscopicEllipsometer
200:Indicates
B:DetectingType
A:Scanningmonochromatorwithsingleelementdetector
B:ArrayTypedetectorwithspectrographorinterferometer
A:VariableIncidentAngleType
A:AutomaticvariableanglewithprecisionGoniometerandcomputercontrolled
M:Manuallyadjustableincidentangleat5degreeinterval
M:MappingStage
300:Maximummappingsamplesize
WavelengthExtensiontoVUVorIRRange
StageSize
ProbingbeamSpotsize
Photometry
Heating/CoolingStage
MappingstageinX-YorRho-Theta
· Semiconductorfabrication(PR,Oxide,Nitride..)
· Liquidcrystaldisplay(ITO,PR,Cellgap…..)
· Biologicalfilmsandmaterials
· Opticalcoatings,TiO2,SiO2,Ta2O5…..
· Semiconductorcompounds
· FunctionalfilmsinMEMS/MOEMS
· Amorphous,nanoandcrystallineSi
· SolarCellIndustry
· Medicaldevicefabrication
Therearemanytechniquesforcharacterizingmaterials,eachhavingitsownadvantagesanddisadvantagesandeachbeinguniquelyabletorevealmaterialpropertiesthatothertechniquescan'taccess.Spectroscopicellipsometry(SE)isanopticaltechniquethatisparticularlyflexibleinthatitcanbeusedtodeterminetheopticalandphysicalpropertiesofawidevarietyofthin-filmmaterials.ItsabilitytodothiswithoutcontactordamagetothematerialofinteresthasseenitbecomeroutinelyusedinR&Dlaboratoriesandwithinmanufacturingfacilitiesformonitoringthinfilmgrowthanddepositionprocesses.
SEreliesonthedeterminationofthepolarizationstateofabeamofpolarizedlightreflectedfromthesampleundercharacterization.WhenperformingSEmeasurements,thepolarizationstateisdeterminedatmanydiscretewavelengthsoverabroadwavelengthrange.Thechangeinthepolarizationstatecanbetracedtothephysicalpropertiesofthethinfilmbymeansofamodel.Characteristicssuchaslayerthickness,surfaceroughness,refractiveindex(n)andextinctioncoefficient(k)ofthematerialscanbedeterminedwithexcellentprecisionthroughregressionanalysis.
TheinstrumentdeterminestwoellipsometryanglesΨandΔ,whichdescribethechangeinthepolarizationstateofthebeamuponreflectionfromthesample.Theratiooftheamplitudeofthepolarizationwithintheplaneofincidence(P)totheamplitudeofthepolarizationperpendiculartotheplaneofincidence(S)isrepresentedbyΨ.ThephaseretardationbetweenthetwopolarizationvectorsPandSisrepresentedbyΔ.ChangesinΔandΨessentiallydependupontheopticalconstants,nandk,ofthelayermaterialsandsubstrate,physicalthicknessoftheindividuallayersandsurfaceroughness.Aregressionanalysisallowsthedeterminationoftheseparameters.
SEdataforΔandΨareobtainedatanumberofincidentanglesinaplanenormaltothesamplesurfaceandtypicallyat100-200differentwavelengthsforeachangle.SEinstrumentsuseawhitelightsourceandindividualwavelengthsareselectedfordetectionbyeitheramotordrivenmonochromator,oramulti-channeldetectorthatcandetectmanywavelengthssimultaneously.Increasingthenumberofanglesandwavelengthsatwhichdataareacquiredimprovesanalysisprecision,especiallyforcomplicatedepitaxialstructures.
1.SystemconfigurationandSpecificationssubjecttochangewithoutnotice
2.*Filmproperty,surfacequalityandlayerstackdependent
3.Customizedsystemavailableforspecialapplications
4.TFProbeisregisteredtrademarkofAngstromSunTechnologiesInc.
二.Microspectrophotometer(微光斑薄膜测试仪)
Features
SystemConfigurations
Specifications
Options
Applications
ApplicationExamples
· AdvancedDUVopticsandruggeddesignforhighestuptimeandthebestsystemperformance
· Arraybaseddetectorsystemtoensurefastmeasurement
· Affordable,portableandsmallfootprinttabletopdesign
· MeasurefilmthicknessandRefractiveIndexupto5layersovermicronsizeregion
· Allowtoacquirereflection,transmissionandabsorptionspectrainmilliseconds
· Capabletobeusedforrealtimespectra,thickness,refractiveindexmonitoring
· Systemcomeswithcomprehensiveopticalconstantsdatabaseandlibrary
· AdvancedSoftwareallowsusertouseeitherNKtable,dispersionorcompositemodel(EMA)foreachindividualfilm
· IntegratedVision,spectrum,simulation,filmthicknessmeasurementsystem
· Applytomanydifferenttypeofsubstrateswithdifferentthicknessupto200mmsize
· Deepultravioletlightallowstomeasurefilmthicknessdownto20Å
· 2Dand3Doutputgraphicsanduserfriendlydatamanagementinterface
· AdvancedImagingsoftwarefordimensionmeasurementsuchasangle,distance,area,particlecountingandmore
· Variousoptionsavailabletomeetspecialapplications
· Detector:CCDArraywith2048 pixels
· LightSource:HighpowerDUV-Visible
· AutomaticStage:BlackAnodizedAluminumAlloywith5”x3”nettraveldistanceand1µmresolution,programcontrolled
· MotorizedZfocusdriveandX-Y-Zjoystick
· LongWorkingDistanceObjectives:4x,10x,15x(DUV),50x
· Communication:USB
· MeasurementType:Reflection/Transmissionspectra,Filmthickness/refractiveindexandfeaturedimensions
· Computer: IntelCore2DuoProcessorwith200GBHarddriveandDVD+RWBurnerplus19”LCDMonitor
· Power:110–240VAC/50-60Hz,3A
· Dimension:16’x16’x18’(Tabletopsetup)
· Weight:120lbstotal
· Warranty:Oneyearlaborandparts
· WavelengthResolution:1nm
· SpotSize:100µm(4x),40µm(10x),30µm(15x),8µm(50x)
· SubstrateSize:upto20mmthick
· Measurablethicknessrange*:20Åto25µm
· MeasurementTime:2msminimum
· Accuracy*:betterthan0.5%(comparingwithellipsometryresultsforThermalOxidesamplebyusingthesameopticalconstants)
· Repeatability*:<2Ǻ(1sigmafrom50thicknessreadingsfor1500ǺThermalSiO2onSiWafer)
· HigherpowerDUVopticsforsmallerspotsize
· Customizedconfigurationforspecialapplications
· HeatingandCoolingStagefordynamicstudy
· Optionalstagesizeholdingsamplesupto300mm
· Higherwavelengthrangeresolutiondownto0.1nm
· Variousfiltersforspecialapplications
· Add-onaccessoriesforfluorescencemeasurement
· Add-onaccessoriesforRamanapplications
· Add-onaccessoriesforpolarizingapplications
· Liquidcrystaldisplay(ITO,PR,Cellgap…..)
· Forensics,Biologicalfilmsandmaterials
· Inks,Mineralogy,Pigments,Toners
· Pharmaceuticals,MedialDevices
· Opticalcoatings,TiO2,SiO2,Ta2O5…..
· Semiconductorcompounds
· FunctionalfilmsinMEMS/MOEMS
· Amorphous,nanoandcrystallineSi
2.MeasuredFilmThickness
3.MeasuredReflectionSpectrumoveraMEMSMirror
4.MappedThicknessUniformityover4"wafer
2.*Filmproperty,surfacequalityandlayerstackdependent
3.Customizedsystemavailableforspecialapplications
4.TFProbeisregisteredtrademarkofAngstromSunTechnologiesInc.
三.SR薄膜反射仪
Features
SystemConfigurations
Specifications
Options
Applications
ApplicationExamples
MoreInformation
FilmThicknessMeasurement-SRM300FilmThicknessGauge
WhenyouneedanaccuratethinfilmthicknessmeasurementourSRM300allowsyoutomapfilmthicknessandrefractiveindexupto5layersthick.NoneedtoworryaboutcomplicatedequipmentsincetheSRM300iseasytosetupandoperate.ItusesWindowsbasedsoftware,somostpeoplearealreadyfamiliarwiththelookandfeeloftheoperatingsystem.Thisfilmthicknessgaugecanhandlevarioustypesofgeometrysubstrateupto300mmindiameterandvarioustypesofmappingpatternssuchaslinear,polar,squareorevenarbitrarycoordinates.Thearraybaseddetectorsystemensuresthefastestfilmthicknessmeasurement.Withitsadvancedopticsandruggeddesignyoucanalwaysbesuretogetthebestsystemperformance.· EasytosetupandoperatewithWindowbasedsoftware
· Varioustypesofgeometrysubstrateupto300mmindiameter
· Varioustypesofmappingpatternsuchaslinear,polar,squareorarbitrarycoordinates
· Advancedopticsandruggeddesignforbestsystemperformance
· Arraybaseddetectorsystemtoensurefastmeasurement
· MapfilmthicknessandRefractiveIndexupto5layers
· Systemcomeswithcomprehensiveopticalconstantsdatabaseandlibrary
· Includecommonlyusedrecipes
· AdvancedTFProbeSoftwareallowsusertouseeitherNKtable,dispersionoreffectivemediaapproximation(EMA)foreachindividualfilm.
· UpgradeabletoMSP(Microspectrophotometer)mappingsystemwithpatternrecognition,orLargeSpotformappingoverpatternedorfeaturedstructure(withZonerageModel)
· Applytomanydifferenttypeofsubstrateswithdifferentthickness
· 2Dand3Doutputgraphicsanduserfriendlydatamanagementinterfacewithstatisticalresults
· Detector:CCDArraywith2048 pixels
· LightSource:DCregulatedTungsten-Halogen
· LightDelivery:Optics
· Stage1:BlackAnodizedAluminumAlloyVacuumchuckholds200mmwafer
· Communication:USB&RS232
· Software:TFProbe2.2M
· MeasurementType:Filmthickness,reflectionspectrum,refractiveindex
· Computer:IntelCore2DuoProcessorwith200GBHarddriveandDVD+RWBurnerplus19”LCDMonitor
· Power:110–240VAC/50-60Hz,3A
· Dimension:14”(W)x20”(D)x14”(H)
· Weight:100lbs
· Warranty:Oneyearlaborandparts
Wavelengthrange:400to1050nm
SpotSize:500µmto5mm
SampleSize:300mmindiameter
SubstrateSize:upto50mmthick
NumberofLayers*:Upto5films
Measurablethicknessrange*:50nmto50µm
MeasurementTime:2ms-1s/sitetypical
PositionalRepeatability:~1µm
Accuracy*:betterthan0.5%(comparingwithellipsometryresultsforThermalOxidesamplebyusingthesameopticalconstants)
Repeatability*:<2Ǻ(1sigmafrom50thicknessreadings atcenterfor1500ǺThermalSiO2onSiWafer)
AdditionalModelswithWavelengthExtensiontoDUVorNIRRange:SRM100:250nm-1000nm
SRM400:900nm-1700nm
SRM500:400nm-1700nm
OtherSampleSize:200mmwafer(SRM300-200)
Customizedsize:Available
LargeSpotAccessoriesforfeaturedstructuremeasurement
Smallspotaccessoriesforhighlynonuniformsamples


