应用领域：
Wafer晶片，微流控系统，金刚石工具，汽车气缸，光学镜片，金属表面，机身外观（汽车），粗糙度标准片。
详情见产品手册。
technology measurementprinciple:white-lightinterferometerscanningdevice:Piezopositioningsystemsystemparameters objectives: upto4objectivesmanualexchangeable/automateddetectionmax.rangeZaxis:400μmtopographyreproducibility*:<0.15nmdigitalization:upto0.01pmscanningspeed: approx.11.4–218μm/s-fullcameraresolutionupto400μm/s–ROI0.4μmstepheight:<1nm(1-σreproducibility)12μmstepheight:<3nm(1-σreproducibility)100μmstepheight:<20nm(1-σreproducibility)smoothsurfaces:upto53°(max.slope)roughsurfaces:upto90°(max.slope)camera pixel:1920x1200speedfullresolution:169Hzspeedsubsampling:533Hz(960x600pixel)speedROI:upto3.2kHzoptional5xobjective fieldofview:3.7x2.3mm2pointspacing:1.9μmoptional10xobjective fieldofview:1.8x1.2mm2pointspacing:0.96μmoptional20xobjective fieldofview:0.91x0.58mm2pointspacing:0.48μmoptional50xobjective fieldofview:0.37x0.23mm2pointspacing:0.19μmoptional100xobjective fieldofview:0.18x0.12mm2pointspacing:0.1μmoptional115xobjective** fieldofview:0.16x0.1mm2pointspacing:0.08μmcontrolunitindustrial19”rackhousingpiezocontrollerLEDlightcontrollermotorizedXYpositioningsystemcontroller(optional)PC,Windows10pro,CoreI5,16GBRAM,500GBSSD,CUDA®compatiblegraphicboardforthefast3dcalculationwithinstalledsoftware documentation factoryacceptanceprotocolCEdeclarationmanuals*Sq/√2–profiledifferenceof2scans,EPSI,singlescan,withoutprofileaveraging,laboratoryconditions,1millionpointsafter3x3denoisingfilter**Olympus100xWLIobjective–thementionedmagnificationiscalculatedinrelationtothe100xNikonobjective
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