SML Resist Territory Business Proposal
Introduction
。 E M Resist Ltd specialises in Electron Beam Lithography (EBL) resists and EBL applications.
。 SML resist is sold successfully worldwide
。 SML is a high aspect ratio positive tone resist, mainly aimed at the research market to enhance EBL tool capabilities and create novel devices
。 We provide sustainable solutions to our customers
。 E M Resist continues to grow with a range of developed and developing resist products for all EBL applications
。 Applications Support and Technical Sales Support is provided as part of our on-going service to all our customers.
。E M Resist ensures quality is paramount in all areas of business – from the production to supply
。 We are determined to understand our customers business and to actively participate in it. We know that when we do this they will come to trust us as a supplier that considers it a priority to improve their productivity, maximize their returns, and help them succeed
。 Here at E M Resist we know it is not enough to simply supply products and services safely, on time, and within specification. That's just good business—we are committed to quality, timeliness, and safety excellence.
。 E M Resist has built a reputation in innovative products, operational excellence and commitment to safety and the environment. Our aim is to develop lasting relationships with our customers and communities based on human qualities, understanding their needs, doing business with integrity and exceeding expectations.
。 A hand-picked team of sales managers, technical sales staff, applications staff and chemical scientists with a combined total experience of 42 years have an advanced range of talented skills for use to your advantage as well as the end users.
SML Customer Samples
SML Resist – Product Information
Introduction
The hardware of electron beam lithography has improved continuously over the past few decades,but electron beam resist technology has not, and this is now one of the main limiting factors in improved EBL performance.
The high performance SML resist is a novel polymer that has been specifically designed to answer the demands of the EBL community. It can be simultaneously patterned into high resolution and high aspect ratio patterns, even at low acceleration voltages, and without the aid of proximity effect correction.
Processing
SML resist has been specifically designed to fit into a standard PMMA process.
。 Solvent: Anisole
。 Pre-bake: typically for 180℃ 2 minutes
。 Exposure/Sensitivity: comparable to PMMA
。 Developer: typically 30s in MIBK:IPA (1:3)
。 Stopper: typically 15s in IPA
。Remover: Acetone
Other Processing Information
。 Slow dry etch rate: significantly slower than PMMA
。 Can be hard-baked: Tg=109℃
。 Can be re-exposed after development
。 Other developers such as IPA:H2O can also be used
。 Shelf life is guaranteed for 6 months
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